| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive photoresist composition excellent in exposure speed, the rate of a residual film, etc., and capable of improving the work environment because a slight offensive odor is emitted. SOLUTION: The positive photoresist composition contains a polymer resin for forming a photoresist film, a photosensitive compound which varies the solubility of the photoresist film by exposure and 3-methoxybutyl acetate, 2- heptanone and 4-butyrolactone as solvents. |
