发明名称 |
PLANAR MAGNETRON SPUTTERING APPARATUS |
摘要 |
A magnet assembly for magnetron sputtering includes a base pole member (14) defining a plane and formed of magnetically permeable material. A center primary magnet (16) is positioned on the base pole member and has its north-south magnetic orientation extending substantially perpendicular to the plane of the base pole member. An outer primary magnet (26) is positioned on the pole member and has a north-south magnetic orientation extending substantially perpendicular to the plane of the base pole member and in a direction opposite to the magnetic orientation of the center primary magnet. A center secondary magnet (20) is positioned between the center primary magnet and the outer primary magnet and has a north-south magnetic orientation extending substantially perpendicular to the plane of the base pole member and in a direction opposite to the magnetic orientation of the center primary magnet. |
申请公布号 |
WO0129874(A1) |
申请公布日期 |
2001.04.26 |
申请号 |
WO2000US28590 |
申请日期 |
2000.10.16 |
申请人 |
CIERRA PHOTONICS, INC. |
发明人 |
KASTANIS, WILLIAM, P.;WESCOTT, M., ELIZABETH |
分类号 |
H01J37/34 |
主分类号 |
H01J37/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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