发明名称 PLANAR MAGNETRON SPUTTERING APPARATUS
摘要 A magnet assembly for magnetron sputtering includes a base pole member (14) defining a plane and formed of magnetically permeable material. A center primary magnet (16) is positioned on the base pole member and has its north-south magnetic orientation extending substantially perpendicular to the plane of the base pole member. An outer primary magnet (26) is positioned on the pole member and has a north-south magnetic orientation extending substantially perpendicular to the plane of the base pole member and in a direction opposite to the magnetic orientation of the center primary magnet. A center secondary magnet (20) is positioned between the center primary magnet and the outer primary magnet and has a north-south magnetic orientation extending substantially perpendicular to the plane of the base pole member and in a direction opposite to the magnetic orientation of the center primary magnet.
申请公布号 WO0129874(A1) 申请公布日期 2001.04.26
申请号 WO2000US28590 申请日期 2000.10.16
申请人 CIERRA PHOTONICS, INC. 发明人 KASTANIS, WILLIAM, P.;WESCOTT, M., ELIZABETH
分类号 H01J37/34 主分类号 H01J37/34
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