发明名称 |
REDUCED POUR POINT SURFACTANTS |
摘要 |
Reduced pour point ethylene oxide-propylene oxide block copolymer surfactants, pour point depressants for reducing the pour point of such surfactants, and a process for preparing such surfactants, wherein the reduced pour point is achieved without adversely affecting the properties or structure of the parent ethylene oxide-propylene oxide block copolymer surfactant or contributing to the formation of a hazy product. According to the present invention, the pour point of ethylene oxide-propylene oxide block copolymer surfactants may be reduced by mixing a parent ethylene oxide-propylene oxide block copolymer surfactant with a pour point depressant comprising a low molecular weight glycol, water, and a dialkyl sulfosuccinate. |
申请公布号 |
WO0129125(A1) |
申请公布日期 |
2001.04.26 |
申请号 |
WO2000US28649 |
申请日期 |
2000.10.16 |
申请人 |
HUNTSMAN PETROCHEMICAL CORPORATION |
发明人 |
LEWIS, DAVID, CHARLES;CHAMPION, DONALD, HUGH |
分类号 |
C08K5/053;C08K5/42 |
主分类号 |
C08K5/053 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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