| 摘要 |
A photomask original form having thereon a layer for protecting the film surface thereof, characterized in that the protective layer is formed by applying, on the film surface of a photosensitive emulsion layer of a photomask original form comprising a substrate and the photosensitive layer formed thereon, a protective layer-forming liquid obtained by preparing and blending a two-part crosslinkable stain-resistant surface coating agent prepared from a mixed resin of a fluororesin and an acrylic resin and a mixed solvent of n-butyl acetate, methyl ethyl ketone and methyl isobutyl ketone, as a main component, a crosslinking and hardening agent comprising a polyisocyanate prepolymer and ethyl acetate, and a diluent comprising n-butyl acetate, methyl ethyl ketone and cellosolve acetate, and aging the liquid; a method for producing the same; and the protective layer-forming liquid. The photomask original form, which has a structure comprising an emulsion mask prepared by a conventional preparation method and, formed thereon, a second layer for protecting the emulsion layer, can be used for overcoming such problems as the susceptibility of the surface thereof to scratches and stains without accompanying the reduction of transmittancy of an ultraviolet ray, which frequently occurs in the case of laminating a protective film, and thus providing a low-cost and durable photomask. |
