发明名称 |
Photosensitive resin compositions, photosensitive element containing the same, process for producing resist pattern, and process for producing printed circuit board |
摘要 |
A photosensitive resin composition comprising (A) a binder polymer, (B1) a photopolymerizable compound having at least one polymerizable cyclic ether group per molecule, and (C1) a photo-acid generator; a photosensitive resin composition comprising (A) a binder polymer, (B2) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group per molecule, and (C1) a photo-acid generator; and a photosensitive resin composition comprising (A) a binder polymer, (B1) a photopolymerizable compound having at least one polymerizable cyclic ether group per molecule, (B2) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group per molecule, and (C2) a free-radical polymerization initiator. |
申请公布号 |
AU7315000(A) |
申请公布日期 |
2001.04.24 |
申请号 |
AU20000073150 |
申请日期 |
2000.09.18 |
申请人 |
HITACHI CHEMICAL CO. LTD. |
发明人 |
TAKAHIRO HIDAKA;MICHIKO NATORI;YASUHARU MURAKAMI;YUKIKO MURAMATSU |
分类号 |
G03F7/004;G03F7/027;G03F7/038 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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