发明名称 Photosensitive resin compositions, photosensitive element containing the same, process for producing resist pattern, and process for producing printed circuit board
摘要 A photosensitive resin composition comprising (A) a binder polymer, (B1) a photopolymerizable compound having at least one polymerizable cyclic ether group per molecule, and (C1) a photo-acid generator; a photosensitive resin composition comprising (A) a binder polymer, (B2) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group per molecule, and (C1) a photo-acid generator; and a photosensitive resin composition comprising (A) a binder polymer, (B1) a photopolymerizable compound having at least one polymerizable cyclic ether group per molecule, (B2) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group per molecule, and (C2) a free-radical polymerization initiator.
申请公布号 AU7315000(A) 申请公布日期 2001.04.24
申请号 AU20000073150 申请日期 2000.09.18
申请人 HITACHI CHEMICAL CO. LTD. 发明人 TAKAHIRO HIDAKA;MICHIKO NATORI;YASUHARU MURAKAMI;YUKIKO MURAMATSU
分类号 G03F7/004;G03F7/027;G03F7/038 主分类号 G03F7/004
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