发明名称 Erasable and programmable nonvolatile semiconductor memory, semiconductor integrated circuit device having the semiconductor memory and method of manufacturing the semiconductor memory
摘要 A nonvolatile semiconductor memory has memory cells (1) each having an insulated-gate FET that has an information storage part. A semiconductor region (27) is formed at the surface of a channel region of each memory cell. The semiconductor region has the same conductivity type as a channel conductivity type and functions to decrease the strength of an electric field at the surface of the channel region. If the insulated-gate FET is of an n-channel type, the semiconductor region is of an n-type. The semiconductor region suppresses threshold voltage variations among the insulated-gate FETs of the memory cells and prevents soft-writing in the memory cells.
申请公布号 US6222224(B1) 申请公布日期 2001.04.24
申请号 US19970994482 申请日期 1997.12.19
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SHIGYO NAOYUKI
分类号 G11C11/56;G11C16/04;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L29/788 主分类号 G11C11/56
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