| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device capable of preventing a work to be processed, such as a metal wiring and the like from being oxidized. SOLUTION: A cleaning device has a cleaning vessel 72 having a processing space S for storing a work W to be processed, a liquid storage tank 30 for storing a cleaning liquid for processing the work W, supply passages 46A-46D for supplying the cleaning liquid from the liquid storage tank 30 to the cleaning vessel 72, and return passages 47A-47D for returning the cleaning liquid from the cleaning vessel 72 to the storing tank 30, and the cleaning vessel 72, the liquid storage tank 30, the supply passages 46A-46D, and the return passages 47A-47D constitute a closed cleaning liquid circulation passages 51A-51D. The cross-sectional area of the processing space S, normal to the direction of the laminar flow of the cleaning liquid crossing over the work W, is set at a value which is a prescribed times larger than the maximum cross-sectional area of the work W normal to the direction described. This prevents the work W, such as metal wiring and the like, from being oxidized.
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