| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film birefringence element which is worked at a low cost, can be mass-produced, prevents an oblique vapor deposition film from peeling, getting cloudy and absorbing light, has improved adhesive strength, optical characteristics, resistance to environment and is highly reliable. SOLUTION: The thin film birefringence element is provided with the oblique vapor deposition film 42 formed by making the material to be evaporated incident on a substrate 40 from an inclined direction. Since the oblique vapor deposition film 42 is characterized by being a monolayer vapor deposition film with controlled film thickness and birefringence, the working cost is reduced and the mass-productivity is ensured compared with the conventional multilayer oblique vapor deposition film. Furthermore, the oblique vapor deposition film is prevented from releasing, getting cloudy and absorbing light and the adhesive strength, the optical characteristics and the resistance to environment of the element are improved by constructing the element with a thin film 43 which improves the adhesive strength, the resistance to environment and the optical characteristics provided between the substrate surface and the oblique vapor deposition film and/or on the oblique vapor deposition film.
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