发明名称 SUSCEPTOR SYSTEM FOR SEMICONDUCTOR MANUFACTURING FACILITY
摘要 <p>PROBLEM TO BE SOLVED: To provide a susceptor system for semiconductor manufacturing facilities, which can prevent process defects caused at evaporation of a high temperature insulating film and can prevent drop in the operation rate of a facility due to the shortened exchange period of a susceptor. SOLUTION: There are provided a heater, a susceptor 10, a vacuum supply line 18 formed of a vacuum hole 12, plural vacuum rings 14 and a connection groove and a N2 supply line 26 constituted of a N2 supply ring 22, whose upper face is opened along the peripheral part of the vacuum ring and which has prescribed depth so that it is arranged in a concentric circle shape with respect to the vacuum ring 14, and a N2 supply hole 24 which, is formed by making it pass vertically through the inner part of the susceptor 10 in a placed detached from the vacuum hole 12 by a prescribed interval, so that it is integrally connected to the N2 supply ring 22.</p>
申请公布号 JP2001110796(A) 申请公布日期 2001.04.20
申请号 JP20000024375 申请日期 2000.02.01
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 KIN TAITEI
分类号 H01L21/683;B01J3/00;B25J15/06;H01L21/283;H01L21/31;H01L21/68;(IPC1-7):H01L21/31 主分类号 H01L21/683
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