发明名称 Top-flow centrifugal fluid pump
摘要 A top-flow fluid pump that is made from a high-purity fluroplastic material is disclosed. The pump is used to circulate extremely corrosive fluids that are heated to temperatures of 160-180° C. through at least one filtration unit. The pump can be used in a semiconductor etching system. The pump utilizes the driven side of an impeller to generate a suction force that draws the corrosive fluid into a pumping chamber from at least one inlet port. A pedestal support or shaft sleeve, through which a motor drive shaft extends, is modified to create an annular passageway that permits the corrosive fluid to enter the pumping chamber from the inlet. With the inlet design of the present invention, a drive motor seal assembly is no longer subjected to corrosive fluid because the seal assembly is positioned on the suction side of the impeller. In a "dead headed" condition, the corrosive fluid flow stops completely as the fluid within the pumping chamber simply remains in shear.
申请公布号 AU7493800(A) 申请公布日期 2001.04.17
申请号 AU20000074938 申请日期 2000.09.15
申请人 LUFRAN INCORPORATED 发明人 HOWARD J. BASE;DANIEL J. OLSON
分类号 F04D7/06;F04D13/08;F04D29/62;F04D29/70 主分类号 F04D7/06
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