发明名称 ARF EXCIMER LASER DEVICE AND FLUORINE LASER DEVICE
摘要 PURPOSE: An ArF excimer laser device conducting high repetitive oscillation operation and a fluorine laser device are provided to change oscillation pulse width into long pulses. CONSTITUTION: In the ArF excimer laser device with a pair of laser discharge electrodes connected at the output ends of a magnetic-pulse compression circuit and arranged into a laser chamber and the fluorine laser device, the excitation of a laser gas is conducted even in the first half period of an oscillating current and at least one half period continued to the half period by shortening the period of the oscillating current flowing between the discharge electrodes and determining a circuit constant so that the peak value of the current is increased, and oscillation pulse width can be changed into long pulses by continuing laser oscillation operation.
申请公布号 KR20010030403(A) 申请公布日期 2001.04.16
申请号 KR20000054244 申请日期 2000.09.15
申请人 NEC CORPORATION;USHIO RESEARCH INSTITUTE OF TECHNOLOGY INC. 发明人 KAKIZAKI KOJI;SAITO TAKASHI;WATANABE HIDENORI
分类号 H01S3/097;H01S3/02;H01S3/038;H01S3/0971;H01S3/225;(IPC1-7):H01S3/02 主分类号 H01S3/097
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