| 摘要 |
<p>PURPOSE: To obtain a light-shielding layer which can be easily etched without etching an indium-tin oxide layer, by a method wherein a tungsten layer or a titanium-tungsten layer is deposited or formed on the indium-tin oxide layer and an optical barrier rib is patterned using a photographic flat plate photoresist treating process and a hydrogen peroxide agent. CONSTITUTION: An optical barrier rib 100 is formed while keeping a conductivity on a transparent layer 102, through which light passes through an optical perception region of an optical perception element 106. The barrier rib 100 consists of a tungsten layer W or a titanium-tungsten layer TiW. A photoresist is formed on the barrier rib 100, the barrier rib 100 is selectively exposed to etch the barrier rib 100 using a hydrogen peroxide agent and the barrier rib 100 consisting of the W or a TiW layer is patterned. The photoresist is removed. At this time, the W or TiW layer is patterned so that the optical perception region, wherein the barrier rib 100 is formed on dark pixels, of the element 106 is at least coated with W or TiW layer. Moreover, the patterned layer 100 prevents the light from striking on a light-receiving region of the element 106.</p> |
