发明名称 CRYSTAL GROWING METHOD FOR SINGLE-CRYSTAL GaN, AND SINGLE-CRYSTAL GaN SUBSTRATE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing GaN single-crystal with low dislocation which is 106 cm-2 or less. SOLUTION: In the crystal growing method of single-crystal gallium nitride, the growth surface of gaseous phase growth is provided with not a plane state but a three-dimensional facet structure, and crystal growth is realized while the facet structure is not embedded but maintained as it is so that dislocation can be reduced.
申请公布号 JP2001102307(A) 申请公布日期 2001.04.13
申请号 JP19990273882 申请日期 1999.09.28
申请人 SUMITOMO ELECTRIC IND LTD 发明人 MOTOKI KENSAKU;OKAHISA TAKUJI;MATSUMOTO NAOKI
分类号 C30B25/02;C30B33/00;H01L21/205;H01L33/00;H01L33/16;H01L33/32 主分类号 C30B25/02
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