发明名称 |
CRYSTAL GROWING METHOD FOR SINGLE-CRYSTAL GaN, AND SINGLE-CRYSTAL GaN SUBSTRATE AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing GaN single-crystal with low dislocation which is 106 cm-2 or less. SOLUTION: In the crystal growing method of single-crystal gallium nitride, the growth surface of gaseous phase growth is provided with not a plane state but a three-dimensional facet structure, and crystal growth is realized while the facet structure is not embedded but maintained as it is so that dislocation can be reduced. |
申请公布号 |
JP2001102307(A) |
申请公布日期 |
2001.04.13 |
申请号 |
JP19990273882 |
申请日期 |
1999.09.28 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
MOTOKI KENSAKU;OKAHISA TAKUJI;MATSUMOTO NAOKI |
分类号 |
C30B25/02;C30B33/00;H01L21/205;H01L33/00;H01L33/16;H01L33/32 |
主分类号 |
C30B25/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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