| 摘要 |
PROBLEM TO BE SOLVED: To sufficiently and carefully prevent accidents, such as falling and the reduction of working efficiency caused by installing a wafer for collecting impurities in a vertical direction for collection work. SOLUTION: The device is equipped with a wafer retention part 5 that retains a wafer 4 horizontally, a collection liquid retention part 1 that retains impuirity collection liquid 3 at a groove part 2 by surface tension, and a control part that controls the position of the collection liquid retention part 1 by using a position adjustment thumb, so that the end of the water 4 being retained by the wafer retention part 5 is positioned in the groove 2 of the collection liquid retention part 1.
|
