发明名称 METHOD FOR GENERATING SEPARATE PLASMA UNIFORMLY APPLIED TO THE WORK SURFACE AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To produce plasma uniformly applied to a work surface of a relatively large size. SOLUTION: An apparatus for generating at least one magnetic field surface having a strength constant and corresponding to an electron cyclotron resonance comprises a part connected to a microwave energy source E, and a part fixedly attached to at least one magnetic dipole 5. A series of separate plasma generation devices respectively consist of a wire applicator 4 of microwave energy. The separate plasma generation devices are distributed near each other to form a plasma diffusion region Z uniformly spread near the work surface Su.
申请公布号 JP2001102200(A) 申请公布日期 2001.04.13
申请号 JP20000231994 申请日期 2000.07.31
申请人 METAL PROCESS SARL 发明人 LAGARDE THIERRY;PELLETIER JACQUES
分类号 H01L21/205;H01L21/302;H01L21/3065;H05H1/46 主分类号 H01L21/205
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