发明名称 |
METHOD FOR GENERATING SEPARATE PLASMA UNIFORMLY APPLIED TO THE WORK SURFACE AND APPARATUS THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To produce plasma uniformly applied to a work surface of a relatively large size. SOLUTION: An apparatus for generating at least one magnetic field surface having a strength constant and corresponding to an electron cyclotron resonance comprises a part connected to a microwave energy source E, and a part fixedly attached to at least one magnetic dipole 5. A series of separate plasma generation devices respectively consist of a wire applicator 4 of microwave energy. The separate plasma generation devices are distributed near each other to form a plasma diffusion region Z uniformly spread near the work surface Su. |
申请公布号 |
JP2001102200(A) |
申请公布日期 |
2001.04.13 |
申请号 |
JP20000231994 |
申请日期 |
2000.07.31 |
申请人 |
METAL PROCESS SARL |
发明人 |
LAGARDE THIERRY;PELLETIER JACQUES |
分类号 |
H01L21/205;H01L21/302;H01L21/3065;H05H1/46 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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