| 摘要 |
PROBLEM TO BE SOLVED: To provide a rice polishing/washing apparatus which can remove an oxidized layer generated on the surface of polished rice, bran adhering to the surface, and bran caught in grooves without roughening the surface of rice. SOLUTION: A rice polishing/washing apparatus has a rice charging port 13, a rice polishing chamber 14, a pair of rice polishing plates 15, 16 having embedded brushes 17, a rice polishing plate cover 21 which surrounds the plates 15, 16 to prevent the scattering of rice outside the plates 15, 16, a rice polishing plate driving means 18 for driving the plates 15, 16, a rice polishing chamber cover 22 for preventing the scattering of rice outside the chamber 14, and a polished rice discharging opening 23. The port 13 and the opening 23 communicate with each other through the chamber 14, the plates 15, 16 are placed in the chamber 14 with the tips of the brushes 17 made to face and approach each other, and numbers of holes are bored in the cover 21. In the apparatus, An oxidized layer generated on the surface of polished rice, bran adhering to the surface, and bran caught in grooves are removed by the brushes 17 arranged vertically without roughening the surface of rice.
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