发明名称 |
CLEANING METHOD AND CLEANING EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To clean a work with high cleaning efficiency. SOLUTION: This cleaning method comprises carrying out surface treatment, for example, polishing the surface of the work such as a magnetic disc substrate and then cleaning the work for removing foreign matter or the like deposited on the surface of the work. The respective works W are put into plural cleaning tanks 11-14 and conveyed at prescribed intervals by a conveyor 20 and cleaned while exposed to the liquid in the tanks. The work picked up one by one from each of the tanks 11-14 is scrubbed/washed one by one by a rotary brush of a scrubbing/cleaning machine provided at each of the scrubbing/cleaning positions 16-19. The treatment in the cleaning tank and the treatment by the scrubbing/cleaning machine are repeated plural times. The work thus cleaned is dried immediately by a spin dryer.
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申请公布号 |
JP2001096245(A) |
申请公布日期 |
2001.04.10 |
申请号 |
JP19990275500 |
申请日期 |
1999.09.29 |
申请人 |
SYSTEMSEIKO CO LTD |
发明人 |
MEGURO AKIRA;MASHIMA TOSHIKAZU |
分类号 |
B08B7/04;B08B3/02;B08B3/04;B08B3/12;C23G3/00;G11B5/84;(IPC1-7):B08B7/04 |
主分类号 |
B08B7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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