发明名称 CLEANING METHOD AND CLEANING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To clean a work with high cleaning efficiency. SOLUTION: This cleaning method comprises carrying out surface treatment, for example, polishing the surface of the work such as a magnetic disc substrate and then cleaning the work for removing foreign matter or the like deposited on the surface of the work. The respective works W are put into plural cleaning tanks 11-14 and conveyed at prescribed intervals by a conveyor 20 and cleaned while exposed to the liquid in the tanks. The work picked up one by one from each of the tanks 11-14 is scrubbed/washed one by one by a rotary brush of a scrubbing/cleaning machine provided at each of the scrubbing/cleaning positions 16-19. The treatment in the cleaning tank and the treatment by the scrubbing/cleaning machine are repeated plural times. The work thus cleaned is dried immediately by a spin dryer.
申请公布号 JP2001096245(A) 申请公布日期 2001.04.10
申请号 JP19990275500 申请日期 1999.09.29
申请人 SYSTEMSEIKO CO LTD 发明人 MEGURO AKIRA;MASHIMA TOSHIKAZU
分类号 B08B7/04;B08B3/02;B08B3/04;B08B3/12;C23G3/00;G11B5/84;(IPC1-7):B08B7/04 主分类号 B08B7/04
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