| 摘要 |
<p>PURPOSE: An apparatus and a method for manufacturing a nitride single crystal substrate are provided to effectively prevent cracks which are produced on the single crystal substrate during the process of forming a nitride single crystal substrate by separating a nitride film formed on a base substrate from the base substrate. CONSTITUTION: The apparatus for manufacturing a substrate comprises a reaction chamber (11A) where a thick film growing process is performed on a base substrate (30); a heating chamber connected to the reaction chamber (11A), wherein a laser irradiating process for manufacturing the substrate is carried out by separating the thick film from the base substrate (30); and a specimen holder (40) maintaining a certain temperature mounted in the heating chamber (11C). The method for manufacturing a substrate comprises the steps of preparing a base substrate; forming a thick film on the base substrate in a reaction chamber; and manufacturing the substrate by irradiating laser on the base substrate as maintaining the base substrate to a certain temperature higher than an ordinary temperature so that the thick film is separated from the base substrate.</p> |
