| 摘要 |
PURPOSE: A diffusion apparatus for a fabrication of a semiconductor device is provided to improve cleaning efficiency by allowing a cleaning gas to be injected all over in a chamber. CONSTITUTION: The diffusion apparatus includes the chamber(20) having a quartz dome(21), an exhaust port(22) formed at one side, and a slot valve(23) formed at the opposite side. In the chamber(20), a chuck(24) capable of rising and falling is disposed and a main gas nozzle(25) for injecting the cleaning gas such as NF3 is placed near one side of the chuck(24). Additionally, an auxiliary gas nozzle(26) is formed close to the slot valve(23) to inject the cleaning gas toward the slot valve(23). Accordingly, it is possible to clean the slot valve(23) as well as inner walls of the chamber(20).
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