发明名称 ALIGNING APPARATUS FOR ION IMPLANTING
摘要 PURPOSE: An aligning apparatus for ion implanting is to perform a position aligning operation between a wafer and an ion generating portion using an optical sensor in which current amount is varied according to light amount. CONSTITUTION: A power portion(20) converts AC power input from an outside into DC power, and then outputs the DC power. A light emitting portion(30) receives operating power from the power portion to radiate light. An electrode(60) has a hole(61) through which the light generated from the light emitting portion is passed. A light receiving portion(40) detects an amount of the light passing through the hole formed at the electrode. A displaying portion(50) displays the light amount detected by the light receiving portion. A lamp is used as the light-emitting portion. The light-receiving portion is a phototransistor, which is operated by the light passing through the hole. The electrode is disposed between the light emitting portion and the light receiving portion to block the light generated from the light emitting portion.
申请公布号 KR20010028484(A) 申请公布日期 2001.04.06
申请号 KR19990040752 申请日期 1999.09.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, SEUNG TAE
分类号 H01L21/265;(IPC1-7):H01L21/265 主分类号 H01L21/265
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