APPARATUS FOR RAPIDLY HEATING SEMICONDUCTOR WAFER

摘要

PURPOSE: An apparatus for rapidly heating a semiconductor wafer is provided to prevent a fine crack of the wafer, by uniformly heating the wafer by a lamp while injected gas passes through a gas distributing plate and a uniform gas flow is performed on the wafer. CONSTITUTION: A plurality of lamps are installed in an outer portion of a tube(12). A wafer tray(15) for loading/unloading a wafer(14) is installed in an inner portion of the tube. A wafer revolving unit is installed in an end portion of the wafer tray. The wafer revolving unit can be a turntable(22) having a motor(21).