发明名称 |
APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: An apparatus for manufacturing a semiconductor device is provided to reduce vortex of gas inside a reactor, by making the inside of the reactor spherical. CONSTITUTION: A reactor supplies a reaction space isolated from the exterior. A pumping port exhausts gas of the reactor. An inside of the reactor is a spherical type. The pumping port is located in a lower end portion of the reactor. The inside of the lower portion of the reactor is composed of a hemispherical chamber, and the upper portion is composed of a quartz dome.
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申请公布号 |
KR20010028358(A) |
申请公布日期 |
2001.04.06 |
申请号 |
KR19990040557 |
申请日期 |
1999.09.21 |
申请人 |
JU SUNG ENGINEERING CO., LTD. |
发明人 |
HWANG, CHEOL JU;SIM, GYEONG SIK |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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