发明名称 APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PURPOSE: An apparatus for manufacturing a semiconductor device is provided to reduce vortex of gas inside a reactor, by making the inside of the reactor spherical. CONSTITUTION: A reactor supplies a reaction space isolated from the exterior. A pumping port exhausts gas of the reactor. An inside of the reactor is a spherical type. The pumping port is located in a lower end portion of the reactor. The inside of the lower portion of the reactor is composed of a hemispherical chamber, and the upper portion is composed of a quartz dome.
申请公布号 KR20010028358(A) 申请公布日期 2001.04.06
申请号 KR19990040557 申请日期 1999.09.21
申请人 JU SUNG ENGINEERING CO., LTD. 发明人 HWANG, CHEOL JU;SIM, GYEONG SIK
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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