发明名称 |
POLYAMIDE-CONTAINING LIGANDS COVALENTLY BONDED TO SUPPORTS, POLYAMIDE-CONTAINING RESINS, AND METHODS FOR REMOVING METALS FROM SOLUTIONS |
摘要 |
Compositions and methods for selectively binding metal ions from source solutions are disclosed. The compositions include 1) polyamide-containing ligands covalently bonded to a particulate solid support, and 2) polyamide-containing polymeric resins. In the case of the ligand bonded to the solid support, the ligand is bounded or tethered to the solid support through a hydrophilic spacer such that the overall formula is SS-A-X-L. In this formula, SS is a particulate solid support such as silica or a polymeric bead, A is a covalent linkage mechanism, X is a hydrophilic spacer grouping, and L is a polyamide-containing ligand having three or more amide groups and two or more amine nitrogens separated by at least two carbons with the proviso that when SS is a particulate organic polymer, A-X may be combined as a single covalent linkage. With respect to the polyamide ligand-containing polymeric resin, this composition is a reaction product of a hydroxymethylated polyamide ligand and a polymerization and/or crosslinking agent.
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申请公布号 |
WO0123067(A1) |
申请公布日期 |
2001.04.05 |
申请号 |
WO2000US26435 |
申请日期 |
2000.09.27 |
申请人 |
IBC ADVANCED TECHNOLOGIES, INC. |
发明人 |
BRUENING, RONALD, L.;KRAKOWIAK, KRZYSZTOF, E. |
分类号 |
C07D273/08;B01J45/00;C02F1/42;C07C237/08;C07C237/10;C07F7/08;C22B3/42;C22B11/00;C22B13/00;C22B15/00;C22B17/00;C22B23/00;C22B26/20;(IPC1-7):B01D15/00 |
主分类号 |
C07D273/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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