发明名称 Method of providing a quantum wire field-effect transistor
摘要 A quantum wire field-effect transistor having at least one, one-dimensional, elongate conducting means (14) provided by at least a first semiconductor layer surrounded by a wider bandgap, second semiconductor layer (12, 13) and extending between source (24) and drain (26) electrodes, and in which there is provided a backgate structure (8, 23) to control conduction in the elongate conducting means. The transistor can be a Single Electron Transistor (SET) wherein two adjacent gate electrode (16, 18) are disposed over the elongate conducting means to induce a quantum dot (17) therein, and it can be made with the first semiconductor layer material as GaAs and the second semiconductor layer material as AlGaAs. A method of making the transistor involves preferentially growing the elongate conducting means at the bottom of a groove (6) lined with second semiconductor layer (12).
申请公布号 EP1088346(A1) 申请公布日期 2001.04.04
申请号 EP19990928062 申请日期 1999.06.18
申请人 THE SECRETARY OF STATE FOR DEFENCE 发明人 JEFFERSON, JOHN HENRY;PHILLIPS, TIMOTHY JONATHAN
分类号 H01L29/06;H01L29/12;H01L29/66;H01L29/76;H01L29/775;H01L29/78;H01L29/80;(IPC1-7):H01L29/772;H01L29/812;H01L29/205;H01L21/335;H01L21/20 主分类号 H01L29/06
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