发明名称 Anti-notch thinning heater
摘要 The invention provides an apparatus for excluding unwanted deposition at the edge of a substrate which prevents excess purge gas from flowing over the surface of the substrate at the region adjacent a notch on a substrate. Another aspect of the invention provides a wider purge gas channel that prevents excess purge gas from flowing over the surface of the substrate. Still another aspect of the present invention provides a purge gas guide that includes a notch therein to prevent excess purge gas from adversely affecting deposition at the vicinity of the substrate notch.
申请公布号 US6210483(B1) 申请公布日期 2001.04.03
申请号 US19980203419 申请日期 1998.12.02
申请人 APPLIED MATERIALS, INC. 发明人 TSAI KEN;GHANAYEM STEVE;YUDOVSKY JOSEPH;LAI KEN
分类号 C23C16/44;C23C16/455;H01J37/32;(IPC1-7):C23C16/00;H05H1/00 主分类号 C23C16/44
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