MASK FOR QUARTZ GLASS ETCHING AND METHOD FOR QUARTZ GLASS ETCHING

摘要

PROBLEM TO BE SOLVED: To provide a mask for quartz glass etching to be applied in the case where the hinge part in the pendulum for an accelerometer is constituted by etching a quartz glass with high 55% or so concentration of hydrogen chloride at several 100μm level of etching for a long time of several hours level of 55% and provide the quartz glass etching process. SOLUTION: The objective mask that is used in the quartz glass etching has the composite layers comprising the metallized layer 61 formed on the surface of the quartz glass 1 and the chemical-resistant organic membrane layer 63 formed on the surface of the metallized layer 61.