发明名称 |
Resist composition and process of forming a patterned resist layer on a substrate |
摘要 |
A radiation sensitive resist composition exhibiting high resolution and enhanced etch resistance comprising a silicon containing polymeric additive, a non-silicon containing base polymer, a photoacid generator and a base is provided. A method of forming a patterned resist film is also provided. A resist film having an upper surface region enriched with silicon is also disclosed.
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申请公布号 |
US6210856(B1) |
申请公布日期 |
2001.04.03 |
申请号 |
US19990238823 |
申请日期 |
1999.01.27 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LIN QINGHUANG;HUGHES TIMOTHY M.;JORDHAMO GEORGE M.;KATNANI AHMAD D.;MOREAU WAYNE M.;PATEL NIRANJAN |
分类号 |
H01L21/027;G03F7/004;G03F7/039;G03F7/075;(IPC1-7):G03C1/725 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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