发明名称 QUARTZ GLASS AND MEASUREMENT OF ITS CO GAS CONCENTRATION
摘要 PROBLEM TO BE SOLVED: To solve a problem in that since in a conventional quartz glass synthesized with a direct method of using an organic silicon compound as a raw material gas, even at 193.4 nm which is a wave length of an ArF excimer laser, its internal absorption coefficient becomes >=0.005 cm-1, and it can not satisfy a specification as a lens member of the image forming system of the excimer laser stepper. SOLUTION: This quartz glass synthesized with a direct method of using a raw material gas consisting of an organic silicon compound is provided by making <=1×1015 cm-3 CO gas concentration contained in the glass, so as to achieve <=0.005 cm-1 internal absorption coefficient in >=190 nm wave length range.
申请公布号 JP2001089182(A) 申请公布日期 2001.04.03
申请号 JP19990272289 申请日期 1999.09.27
申请人 NIKON CORP 发明人 KOMINE NORIO;FUJIWARA MASASHI;JINBO HIROKI
分类号 C03B8/04;C03B19/14;C03B20/00;C03C3/06;C03C4/00;(IPC1-7):C03C3/06 主分类号 C03B8/04
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