| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition excellent in resolving power, developer resistance, sandblast resistance, etc. SOLUTION: This pbotosensitive resin composition contains a carboxyl- containing urethane acrylic resin (A) obtained by reacting a carboxyl-containing diol compound and a diol compound having an average molecular weight of <=500 and no acid value with a polyisocyanate compound and reacting the resulting urethane compound with a compound having one or more ethylenically unsaturated groups and one hydroxyl group, a photopolymerization initiator (B) and an acrylic polymer (C) containing >=50 wt.% hydroxyl-containing monofunctional monomer and having <=50 mgKOH/g acid value. Preferably the composition further contains an alkyl (meth)acrylate (D). |
