发明名称 METHOD FOR MANUFACTURING FINE STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing an organic material or organic molecule of a fine structure body in the order of nanometer-scale. SOLUTION: This method comprises a first process to form, on the surface of a substrate 10, patterns 16, 18 of charges by giving the positive or negative charges in local area, and a second process to form the layer 20 (22, 24) of organic molecules based on the pattern of charges by immersing the basic material into the solution including organic molecules in the functional group having negative charges or positive charges as a part of the structure.
申请公布号 JP2001085667(A) 申请公布日期 2001.03.30
申请号 JP19990262664 申请日期 1999.09.16
申请人 SEIKO EPSON CORP 发明人 ISHIDA MASAYA
分类号 H01L29/06;H01L21/027;(IPC1-7):H01L29/06 主分类号 H01L29/06
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