发明名称 CHARGED PARTICLE BEAM IRRADIATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To shorten the time for interrupting irradiation with charged particle beam during maintenance of a diaphragm to approximately consecutively continue processing with irradiation with the charged particle beam during the maintenance, by making the diaphragm partitioning between a reactor and an irradiated object movable. SOLUTION: It is preferable to allow to interchange or maintain a diaphragm 3 without opening a charged particle source side to air, by providing a gate valve 8 between the diaphragm 3 and a charged particle source, and a sealing mechanism 7 between the diaphragm 3 and a wall of the device. Electron beam 1 is stopped by turning off a switch of the acceleration voltage of the electron beam 1. Upstream and downstream sides of the diaphragm 3 are then under atmospheric pressure by closing the gate valve 8. The diaphragm 3 is slid by the sealing mechanism 7 and moved, and new diaphragm 3 is placed on an optical path of the electron beam 1. The gate valve 8 is opened and the acceleration voltage of the electron beam 1 is turned on, and new micro aperture 5 is pierced by the electron beam itself to continue operation. The diaphragm 3 moved is maintained by performing filling of the enlarged micro aperture 5 through welding and the like.
申请公布号 JP2001084948(A) 申请公布日期 2001.03.30
申请号 JP19990263192 申请日期 1999.09.17
申请人 HITACHI LTD 发明人 TAKEUCHI KAZUHIRO;KAWAKUBO YUKIO;SATO TADASHI
分类号 H01J37/18;G21K5/04;H01J37/301;(IPC1-7):H01J37/301 主分类号 H01J37/18
代理机构 代理人
主权项
地址