| 摘要 |
A projection exposure apparatus includes an original table for holding an original having a pattern to be transferred, a projection optical system, a substrate stage for holding a substrate to be exposed through the projection optical system, and a supporting member for supporting the projection optical system, wherein at least a portion of the supporting member is made of one of a ceramics material and a compound material provided by integrally sintering a ceramics material and a metal material.
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