发明名称 DRYER AND DRYING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a dryer in which particles can be removed surely from the surface of a matter to be dried without causing any stain (water mark) thereon. SOLUTION: The dryer 1 comprises a drying tank 7, a processing liquid supply section 6, a vapor supply section 18, and first and second inert gas supply units 2, 42. The drying tank 7 contains a wafer 3 and the processing liquid supply section 6 supplies pure water thereto. The vapor supply section 18 comprises an organic solvent heating tank 19 and a slit 21. The organic solvent heating tank 19 comprises an inner tank 22 and an outer tank 23. The inner tank 22 contains an organic solvent and an outer tank 23 is supplied with heating liquid. The organic solvent is heated to produce vapor. The slit 21 interconnects the drying tank 7 and the organic solvent heating tank 19. The first inert gas supply unit 2 supplies inert gas from the upper part of the drying tank 7 and the second inert gas supply unit 42 supplies inert gas to the organic solvent contained in the inner tank 22.
申请公布号 JP2001074374(A) 申请公布日期 2001.03.23
申请号 JP20000033504 申请日期 2000.02.10
申请人 KINMON KORUTSU:KK;OMEGA SEMICON DENSHI KK 发明人 ONODA HAJIME;WATANABE KAZUTOSHI;TAKAHASHI HIROKI
分类号 H01L21/304;F26B21/04;H01L21/00;(IPC1-7):F26B21/04 主分类号 H01L21/304
代理机构 代理人
主权项
地址