| 摘要 |
PROBLEM TO BE SOLVED: To treat a plurality of bodies to be cleaned at the same time to enhance the productivity of the bodies to be cleaned. SOLUTION: This cleaning device is for cleaning bodies W to be cleaned, such as semiconductor wafers, with a cleaning fluid in a cleaning container 2 capable of flowing-in and letting-out this cleaning fluid. Here, a housing container 8 for housing a plurality of the bodies W to be cleaned is provided in the interior of the container 2. A plurality of inflow ports 11 for making the cleaning fluid flow in the interior of the container 8, and a plurality of outlet ports 12 for making the cleaning fluid let to the outside of the container 8, are provided in the container 8. The inflow ports 11 and the outlet ports 12 are formed in such a way that the areas of the respective apertures of the ports 11 and 12 and/or the numbers of the respective apertures of the ports 11 and 12 are different from each other in the mounting direction of the bodies W, so that the quantity of the cleaning fluid, which flows on the surface of each body W to be cleaned, is uniformly flowed.
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