Foto-basevormend middel en foto-zuurvormend middel bevattende foto- etssamenstelling.

摘要

A photoresist composition comprises photoresist resin, photoacid generator (PAG), photobase generator (PBG) and organic solvent. An independent claim is also included for the method used for forming photoresist pattern. The photoresist composition is coated on a substrate to form photoresist film which is exposed to light, using an exposure. The exposed photoresist film is then developed.