发明名称 MULTI-CHANNEL INSULATED-GATE BIPOLAR TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To obtain a multi-channel IGBT, which can be further improved its on-state current density and latch-up breakdown strength. SOLUTION: N+ impurity regions 9a to 9c, P+ impurity regions 10a and 10b and gate electrodes 8a and 8b are respectively formed into an annular shape, in such a way as to encircle a P+ impurity region 10c. Moreover, p-type well regions, which are respectively formed selectively within the main surfaces of a gate oxide film 7 and an N-type drift layer 3, which are the base film and the base layer of the electrodes 8a and 8b, are also respectively formed in an annular shape so as to encircle the region 10c.
申请公布号 JP2000286416(A) 申请公布日期 2000.10.13
申请号 JP19990087376 申请日期 1999.03.30
申请人 MITSUBISHI ELECTRIC CORP 发明人 WATABE KIYOTO
分类号 H01L29/78;H01L29/739;H01L29/786;(IPC1-7):H01L29/78 主分类号 H01L29/78
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