发明名称 POWDER REMOVING METHOD FOR PLASMA CVD SYSTEM
摘要 PROBLEM TO BE SOLVED: To prevent an exhaust pump from clogging and being reduced in its exhaust capability. SOLUTION: In this method for removing Si-based powders 37 staying in a plasma generating part 31 in a plasma CVD system having the plasma generating part 31 and exhaust pumps 34a and 34b connected to each other through the plasma generating part 31 and exhaust pipes 32 and 35, a storage part 38 for falling powders deposited on the inside of piping from the plasma generating part 31 and storing them, and a freely openable/closable flange 39 for discharging the Si-based powders 37 in the storage part 38 to the outside are provided at the lowest part of the vertical descending portion of the exhaust pipe 32.
申请公布号 JP2001073143(A) 申请公布日期 2001.03.21
申请号 JP19990254341 申请日期 1999.09.08
申请人 MITSUBISHI HEAVY IND LTD 发明人 UENO MOICHI;YAMAUCHI YASUHIRO;AOI TATSUFUMI;SASAGAWA EISHIRO;NAWATA YOSHIICHI;FUJIYAMA TAIZO
分类号 H01L21/31;C23C16/44;(IPC1-7):C23C16/44 主分类号 H01L21/31
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