NOVEL PHOTORESIST MONOMER, POLYMER THEREOF AND PHOTORESIST COMPOSITION THEREOF

摘要

PURPOSE: Novel photoresist monomer is provided which includes bicyclo derivatives with hydroxyl radicals and those with carboxyl radicals so that it shows excellence in adhesive property and sensitivity. CONSTITUTION: The novel photoresist monomer shown in a chemical formula(1) is prepared by the following steps of: (i) melting glycols in organic solvent; (ii) adding a compound shown in a chemical formula(3) under acidic or basic catalyst; (iii) distilling and eliminating the organic solvent; (iv) neutralizing the resultant solution and extracting; and (v) recrystallizing the extracted solution in organic solvent like benzene or so to prepare the photoresist monomer.