发明名称 PHOTOCATALYST FILM AND ITS PRODUCTION
摘要 <p>PROBLEM TO BE SOLVED: To prepare a photocatalyst film improved in efficiency by increasing the porosity and specific surface area of the photocatalyst film. SOLUTION: The specific surface area of this photocatalyst film can be increased compared with the conventional photocatalyst films, since this photocatalyst film formed on a substrate has >=40% and <=80% open porosity. Therefore, since the contact area of the photocatalyst film with various contaminants is increased, the photocatalytic reaction proceeds more efficiently to achieve large improvement of the photocatalyst efficiency. The photocatalyst film is made from a compound such as TiO2, SrTiO3, CdS, CdTe, Si, WO3, MoS2, Bi2O3, ZnO, SiC, GaP, GaAs and Fe2O3 and the substrate to be used has >=50% and <=95% open porosity.</p>
申请公布号 JP2001070802(A) 申请公布日期 2001.03.21
申请号 JP19990250198 申请日期 1999.09.03
申请人 TOSHIBA CORP;TOSHIBA ELECTRONIC ENGINEERING CORP 发明人 SAYANO AKIO;ITO YOSHIYASU;SUYAMA AKIKO;SEGAWA NOBORU;IKEDA MAKOTO
分类号 C02F1/32;B01J21/16;B01J35/02;B01J37/08;(IPC1-7):B01J35/02 主分类号 C02F1/32
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