发明名称 |
Method for manufacturing a color filter |
摘要 |
The present invention discloses color pattern manufacturing method comprising the steps of forming a conductive film having an arbitrary pattern on a substrate, forming a colored layer on the conductive film by electrodeposition, and forming a method film having an arbitrary pattern on the colored layer to shield undesirable light transmittance through between the arbitrary patterns of the colored layer, so that the color filter having high quality is made by remarkably simple process.
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申请公布号 |
US6203950(B1) |
申请公布日期 |
2001.03.20 |
申请号 |
US19920840345 |
申请日期 |
1992.02.24 |
申请人 |
SHINTO CHEMITRON CO. LTD.;SEIKO INSTRUMENTS INC. |
发明人 |
KAMAMORI HITOSHI;IWASA KOJI;FUKUCHI TAKAKAZU;SUGINOYA MITSURU;WATANABE TSUTOMU;OTA TOSHIAKI;YASUKAWA JUNICHI |
分类号 |
G02F1/1335;G02F1/1343;G03F7/00;G03F7/16;(IPC1-7):G02B5/20;G02F1/133 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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