| 摘要 |
PROBLEM TO BE SOLVED: To obtain a hardenable composition for an etching resist giving a hardened film superior in etching resistance, alkali solubility peelability and pattern forming property, even in secondary etching at a high temperature. SOLUTION: The hardenable composition consists essentially of a compound, having one carboxyl group and one (meth)acryloyl group per molecule and a di (meth)acrylate obtained by esterifying (meth)acrylic acid with a dihydric alcohol, to which two or three alkylene oxide units based on one molecule of bisphenol A have been added. |
