发明名称 FINE PATTERN FORMING DEVICE AND METHOD
摘要 PROBLEM TO BE SOLVED: To enable a fine pattern to be very accurately formed by a method wherein an ink path is provided respectively to fine openings provided on the surface of a silicon substrate, and an ink feed device is connected to the ink paths. SOLUTION: A silicon substrate 2 is equipped with fine holes 3 which penetrate through it from its front surface 2A to the rear surface 2B, and the openings 3A of the fine holes 3 on a front surface side are made to come out in a gap between the silicon substrate 2 and a support member 6. The gap is formed through such a manner where the flange 6b of the support member 6 is fixed to the peripheral edge of the front surface 2A of the silicon substrate 2, an opening 6c is formed at the center of the base 6a of the support member 6, and the one end of an ink path 8 is connected to the opening 6c. The other end of the ink path 8 is connected to an ink feed device 9. By this setup, a fine pattern can be very accurately formed.
申请公布号 JP2001068827(A) 申请公布日期 2001.03.16
申请号 JP19990239462 申请日期 1999.08.26
申请人 DAINIPPON PRINTING CO LTD 发明人 FUJITA HIROYUKI;ZEN KYOSHAKU;DAITO RYOICHI
分类号 B41J2/16;G02F1/13;H05K3/10;(IPC1-7):H05K3/10 主分类号 B41J2/16
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