| 摘要 |
<p>PROBLEM TO BE SOLVED: To enable irradiation a material to be exposed, such as a photoresist, with proximity field light at sufficient intensity and to solve the problem of fogging and durability by a small thickness of a light-shielding film with a mask for proximity field optical exposure which is formed with the light shielding film, in such a manner as to leave the apertures of prescribed patterns on the one surface side of a mask preform which is transparent with respect to exposure light. SOLUTION: A mask 20 for proximity field optical exposure is constituted by forming a light-shielding film 11, so as to leave the apertures 11a of the prescribed patterns on one surface side of the mask preform 10 which is transparent to the exposure light. A packing member 14, which is transparent to the exposure light is disposed in the apertures 11a so as to project at a prescribed height from the surface portion of the mask preform 10 formed with the light-shielding film 11 and is formed in a range, such that h-50 nm<=d<=h+50 nm is attained when the thickness of the light-shielding film 11 is defined as (d) and the projection height of the packing member 14 as (h).</p> |
