POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PURPOSE: Provided is a positive type photoresist composition useful in formation of photoresist film for liquid crystal display circuit and/or microcircuit used in semiconductor area by comprising polymer resin and sensitive compound and reducing bad smell. CONSTITUTION: A positive type photoresist composition comprises polymer resin to form photoresist film, sensitive compound to alterate solubility of the film and solvent such as 3-methoxybutylacetate and 4-butyrolactone. The composition preferably contains novolak resin as the polymer resin, diazide compound as the sensitive compound. The 3-methoxybutylacetate and 4-butyrolactone are blended, by weight part, in a ratio of 60-80 : 2-10. The positive type photoresist composition effects industrial application because of its excellent properties such as sensing rate, residual rate, resolution and/or adhesiveness to substrate.