发明名称 ORGANIC POLYMER FOR PROTECTING DIFFUSE REFLECTION
摘要 PURPOSE: An organic polymer for protecting diffuse reflection is provided for possessing good heat-resistance and adhesiveness as well as superior absorbency of far-infrared ray by means of ArF light source having wavelength of 193nm. CONSTITUTION: An organic polymer for preventing diffuse reflection comprises dihydrocarveol as a first monomer and another compound selected from N-benzyl maleimide or phenyl maleimide as a second monomer. The first monomer can efficiently absorb far-infrared ray having 250nm or less and have hydroxy group to increase adhesive strength to substrate and be advantageous to cross-linkage formation with epoxy group. The second monomer can serve to absorb far-infrared ray and easily react with any monomer.
申请公布号 KR20010019926(A) 申请公布日期 2001.03.15
申请号 KR19990036604 申请日期 1999.08.31
申请人 HYNIX SEMICONDUCTOR INC. 发明人 JUNG, JAE CHANG;NOH, CHI HYEONG
分类号 G03F7/004 主分类号 G03F7/004
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