发明名称 |
ORGANIC POLYMER FOR PROTECTING DIFFUSE REFLECTION |
摘要 |
PURPOSE: An organic polymer for protecting diffuse reflection is provided for possessing good heat-resistance and adhesiveness as well as superior absorbency of far-infrared ray by means of ArF light source having wavelength of 193nm. CONSTITUTION: An organic polymer for preventing diffuse reflection comprises dihydrocarveol as a first monomer and another compound selected from N-benzyl maleimide or phenyl maleimide as a second monomer. The first monomer can efficiently absorb far-infrared ray having 250nm or less and have hydroxy group to increase adhesive strength to substrate and be advantageous to cross-linkage formation with epoxy group. The second monomer can serve to absorb far-infrared ray and easily react with any monomer. |
申请公布号 |
KR20010019926(A) |
申请公布日期 |
2001.03.15 |
申请号 |
KR19990036604 |
申请日期 |
1999.08.31 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
JUNG, JAE CHANG;NOH, CHI HYEONG |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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