发明名称 Field-effect semiconductor device
摘要 <p>A field-effect semiconductor device including a channel layer (4); a contact layer (6); a semiconductor structure (5) having an electron-affinity different from those of the channel layer (4) and the contact layer (5) and formed between the channel layer (4) and the contact layer (5); an ohmic electrode (8,9) formed on the contact layer (6); and a Schottky electrode (10) formed on the semiconductor structure (5). The junction between the channel layer (4) and the semiconductor structure (5) and the junction between the contact layer (6) and the semiconductor structure (5) are isotype heterojunctions. &lt;IMAGE&gt;</p>
申请公布号 EP1083608(A1) 申请公布日期 2001.03.14
申请号 EP20000119779 申请日期 2000.09.11
申请人 MURATA MANUFACTURING CO., LTD. 发明人 INAI, MAKOTO;SASAKI, HIDEHIKO
分类号 H01L29/812;H01L21/338;H01L29/778;H01L29/80;(IPC1-7):H01L29/80 主分类号 H01L29/812
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