| 摘要 |
<p>The disclosure relates to an apparatus and a method for scanning a substrate in a processing system (40). A transmitter unit (56) and a receiver unit (58) are disposed on a processing system and cooperate to transmit and detect energy, respectively. The transmitter unit is positioned to transmit a signal onto the substrate surface (37) moving between vacuum chambers (44), one of which is preferably a transfer chamber (42) of a cluster tool (100). Features disposed on the substrate surface, which may include particles, devices, alphanumeric characters, the substrate edges, notches, etc., cause a scattering or reflection of a portion of the signal. The receiver unit is disposed to collect the scattered/reflected portion of the signal and direct the same to a precessing unit (86). Preferably, the transmitter unit comprises a laser source and the receiver unit comprises a charged-coupled device (CCD). Preferably, the invention is integrally positioned in a processing system to allow substrate inspection during normal operation and provide real-time information. <IMAGE></p> |
