发明名称 |
Photocurable resin composition |
摘要 |
There is provided a photocurable resin composition comprising (A) an urethane acrylate having three or four acrylate groups in the molecule, (B) a radical polymerizable compound different from the above urethane acrylate; and (C) a photopolymerization initiator, the weight ratio of the urethane acrylate (A) to the radical polymerizable compound (B) being 80:20 to 10:90; and a production process thereof. The said photocurable resin composition can provide moldings and stereolithographed objects having excellent dimensional accuracy with a small volume shrinkage factor at the time of photo-curing and excellent heat resistance with a high thermal deformation temperature as well as excellent transparency and mechanical properties such as tensile strength.
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申请公布号 |
US6200732(B1) |
申请公布日期 |
2001.03.13 |
申请号 |
US19970837982 |
申请日期 |
1997.04.14 |
申请人 |
TEIJIN SEIKEI CO., LTD. |
发明人 |
TAMURA YORIKAZU;HAGIWARA TSUNEO |
分类号 |
G03F7/00;G03F7/027;(IPC1-7):G03F7/027;G03F7/26;G03C9/08 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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