发明名称 ZnO crystal growth method, ZnO crystal structure, and semiconductor device using ZnO crystal
摘要 A ZnO crystal growing method having the steps of: growing a low temperature growth ZnO layer on a sapphire substrate at a temperature lower than a single crystal ZnO growth temperature; thermally processing the low temperature growth ZnO layer at a temperature near to a growth temperature of a high temperature growth single crystal ZnO layer higher than the growth temperature of the low temperature growth ZnO layer; and growing a high temperature growth single crystal ZnO layer on the low temperature growth ZnO layer at a temperature higher than the growth temperature of the low temperature growth ZnO layer. ZnO crystal of good quality with a reduced number of crystal defects can be grown on a sapphire substrate.
申请公布号 EP1081256(A2) 申请公布日期 2001.03.07
申请号 EP20000118859 申请日期 2000.08.31
申请人 STANLEY ELECTRIC CO., LTD.;YAO, TAKAFUMI 发明人 SANO, MICHIHIRO;YAO, TAKAFUMI
分类号 C30B23/02;H01L21/363;H01L21/365;H01L33/28 主分类号 C30B23/02
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