| 摘要 |
PROBLEM TO BE SOLVED: To obtain the shape of the pattern of a mask to be illuminated with exposing lights as a target value in each part on a substrate at the transfer of the image of the pattern to the substrate, while overlapping the mutually peripheral parts of the image of the pattern of the mask. SOLUTION: This aligner 1 is provided with an illuminating amount adjusting device 4 arranged, so that the mutual peripheral parts of the exposed region of the image of the pattern of a mask M to be transferred to a substrate W and the image of the pattern previously transferred to the substrate W for adjusting the irradiating amounts of the exposing lights of the overlapped part, a shape-measuring equipment 8 for measuring the shape of the image of the pattern of the overlapped part formed on the substrate W, and a control part 9 for controlling the irradiating amount adjusting device 4, so that the shape of the image of the pattern of the overlapped part formed on the substrate W can be obtained as a target value. |
